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      Ultra pure water system for semiconductor and packaging industries

      Ultra pure water system for semiconductor and packaging industries

      The resistivity of 18.25M Ω· cm is considered the optimal theoretical water quality indicator for ultrapure water. With the development of the microelectronics industry, using only this indicator to measure ultrapure water is far from enough. Particles in ultrapure water TOC、 Dissolved oxygen, silicon dioxide, bacteria, and other PPT grade metal ions have become the main factors affecting the quality and yield of products in the microelectronics industry and other industries.

      Typical process flow in the semiconductor industry

       

      ASTM Water Quality Standards for Ultra Pure Water in the Electronic Semiconductor Industry in the United States

      Parameter

      Type E-1

      Type E-1.1

      Type E-1.2

      Linewidth(microns)

      1.0-0.5

      0.5-0.25

      0.25-0.18

      Resistivity,25℃

      18.2

      18.2

      18.2

      *Temperature

       

       

       

      *Pressure

       

       

       

      Endotoxin unit(EU/ml)

      0.03

      0.03

      0.03

      TOC(μg/L)

      5

      2

      1

      Dissolved oxygen(μg/L)

      1

      1

      1

      Residue after evaporation(μg/L)

      1

      0.5

      0.1

      SEM particles/L(micron range)

       

       

       

      0.1-0.2

      1000

      1000

      200

      0.2-0.5

      500

      500

      100

      0.5-0.1

      50

      50

      1

      10

      -

       

      -

      On-line particles/L(micron range)

       

       

       

      Particles(>0.05micron)

       

       

       

      0.05-0.1

      500

      500

      100

      0.1-0.2

      300

      300

      50

      0.2-0.3

      50

      50

      20

      0.3-0.5

      20

      20

      10

      >0.5

      4

      4

      1

      Bacteria/100 mL

       

       

       

      100ml Sample

      1

      1

      1

      1L Sample

      1

      1

      0.1

      Silica

       

       

       

       

       

       

       

      Silica-total(μg/L)

      3

      0.5

      0.5

      Silica-dissolved(μg/L)

      1

      0.1

      0.05

      lons and metals(μg/L)

       

       

       

      Ammonium

      0.1

      0.10

      0.05

      Bromide

      0.1

      0.05

      0.02

      Chloride

      0.1

      0.05

      0.02

      Fluoride

      0.1

      0.05

      0.03

      Nitrate

      0.1

      0.05

      0.02

      Nitrite

      0.1

      0.05

      0.02

      Phosphate

      0.1

      0.05

      0.02

      Sulfate

      0.1

      0.05

      0.02

      Aluminum

      0.05

      0.02

      0.005

      Barium

      0.05

      0.02

      0.001

      Boron

      0.05

      0.02

      0.005

      Calcium

      0.05

      0.02

      0.002

      Chromium

      0.05

      0.02

      0.002

      Copper

      0.05

      0.02

      0.002

      Iron

      0.05

      0.02

      0.002

      Lead

      0.05

      0.02

      0.005

      Lithium

      0.05

      0.02

      0.003

      Magnesium

      0.05

      0.02

      0.002

      Manganese

      0.05

      0.02

      0.002

      Nicke

      0.05

      0.02

      0.002

      Potassium

      0.05

      0.02

      0.005

      Sodium

      0.05

      0.02

      0.005

      Strontium

      0.05

      0.02

      0.001

      Zinc

      0.05

      0.02

      0.002

       

       

       

       

      *Temperature and pressure values to be determined
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